发明名称 NOVEL SILOXANE-BASED RESIN PREPARED BY HYDROLYSIS AND CONDENSATION OF SPECIFIC MONOMERS, AND INTERLAYER INSULATION FILM FORMED THEREFROM
摘要 <p>PURPOSE: Provided are a siloxane-based resin with superior solubility in an organic solvent and good fluidity, and an interlayer insulating film formed therefrom having excellent mechanical physical properties. CONSTITUTION: The siloxane-based resin is prepared by hydrolysis and condensation of a monomer represented by the formula 1 and a monomer selected from the group consisting of compounds represented by the formula 2 to 6 in the presence of an organic solvent using an acid or a basic catalyst, and water. In the formula 1-6, R, R1 and R2 are independently a hydrogen atom, a C1-C3 alkyl group, a C6-C10 cycloalkyl group, or a C6-C15 aryl group, X1-X6 are independently a halogen atom or a C1-C5 alkoxy group, m is an integer of 1-5, n and s is an integer of 1-3, p and q are each an integer of 0-1, r is an integer of 0-10, and t is an integer of 3-8. The interlayer insulating film is formed by dissolving such siloxane-based resin in an organic solvent and coating the solution onto a silicone substrate, followed by heat-curing.</p>
申请公布号 KR20050024721(A) 申请公布日期 2005.03.11
申请号 KR20030060811 申请日期 2003.09.01
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JEONG, HYUN DAM;LYU, YI YEOL;RYU, JOON SUNG;SONG, KI YONG;YIM, JIN HEONG
分类号 C08G77/50;C08G77/14;C08L83/04;C09D183/14;H01L21/312;H01L21/316;(IPC1-7):C08L83/04 主分类号 C08G77/50
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