摘要 |
<p>PURPOSE: Provided are a siloxane-based resin with superior solubility in an organic solvent and good fluidity, and an interlayer insulating film formed therefrom having excellent mechanical physical properties. CONSTITUTION: The siloxane-based resin is prepared by hydrolysis and condensation of a monomer represented by the formula 1 and a monomer selected from the group consisting of compounds represented by the formula 2 to 6 in the presence of an organic solvent using an acid or a basic catalyst, and water. In the formula 1-6, R, R1 and R2 are independently a hydrogen atom, a C1-C3 alkyl group, a C6-C10 cycloalkyl group, or a C6-C15 aryl group, X1-X6 are independently a halogen atom or a C1-C5 alkoxy group, m is an integer of 1-5, n and s is an integer of 1-3, p and q are each an integer of 0-1, r is an integer of 0-10, and t is an integer of 3-8. The interlayer insulating film is formed by dissolving such siloxane-based resin in an organic solvent and coating the solution onto a silicone substrate, followed by heat-curing.</p> |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JEONG, HYUN DAM;LYU, YI YEOL;RYU, JOON SUNG;SONG, KI YONG;YIM, JIN HEONG |