THIN FILM FORMATION METHOD, AND PARTICLE NUMBER EVALUATING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a thin film formation method capable of decreasing the number of particles on a substrate, and a particle number evaluating method. SOLUTION: In a process of introducing film formation gas and forming a film by CVD, a temperature in a route to the inside of a shower head at the upper place of a reaction chamber from the system including a vaporization system is set at a temperature which is not lower than a vaporization temperature but not higher than a decomposition temperature of at least one of materials and where the number of particles generated during the film formation process reaches the minimum. COPYRIGHT: (C)2005,JPO&NCIPI