| 发明名称 |
METHOD FOR FORMING PATTERN, METHOD FOR FORMING WIRING PATTERN, ELECTRO-OPTIC APPARATUS AND ELECTRONIC APPLIANCE |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming a pattern for patterning a thin film by an easy low-cost apparatus configuration. <P>SOLUTION: A thin film 2 is formed on a substrate 1 containing a photo-thermal converting material which converts light energy into heat energy, and the substrate 1 is irradiated with light to remove the thin film 2 corresponding to the irradiation region irradiated with the light so as to pattern the thin film 2. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
| 申请公布号 |
JP2005062356(A) |
申请公布日期 |
2005.03.10 |
| 申请号 |
JP20030290657 |
申请日期 |
2003.08.08 |
| 申请人 |
SEIKO EPSON CORP |
发明人 |
TOYODA NAOYUKI |
| 分类号 |
G03F7/004;B05D3/12;B05D7/00;B32B3/00;G02F1/1343;G03F7/11;G03F7/36;H01L21/027;H01L51/50;H05B33/10;H05B33/14;H05B33/26;H05K3/06;H05K3/10;H05K3/12;H05K3/14 |
主分类号 |
G03F7/004 |
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