| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas-barrier film which has an inorganic vapor deposition layer of a metal or an inorganic oxide on at least one side of a plastic film substrate, is improved in bending resistance and oxygen-barrier properties of an inorganic vapor deposition film, prevents the improved properties from being deteriorated by moisture, and has moisture resistance and a method for producing the film. SOLUTION: The inorganic vapor deposition layer of the metal or the inorganic oxide and an organic vapor deposition layer of a 1,3,5-triazine derivative are formed in turn on at least one side of the plastic film substrate, and reactive ion etching (RIE) treatment using plasma is applied to the organic vapor deposition layer. COPYRIGHT: (C)2005,JPO&NCIPI
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