发明名称 |
PHOTODEPOSITION GOLD PLATING METHOD AND GOLD PLATING FORMATION APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a photodeposition gold plating method which can be easily practiced without limitation on the conductivity of a substrate or can simply perform the formation of a gold plating locally or entirely on the surface of the substrate. SOLUTION: The photodeposition gold plating method comprises setting a substrate 2 to be plated in an aqueous solution containing metal ions and a reducing agent and irradiating the substrate 2 with light in the ultraviolet region from a light source 6 to form a gold plating on the surface of the substrate 2 by a photodeposition reaction. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005060828(A) |
申请公布日期 |
2005.03.10 |
申请号 |
JP20040210430 |
申请日期 |
2004.07.16 |
申请人 |
ICHIMURA MASAYA;MASUI KANJI;TOKAI RIKA CO LTD |
发明人 |
ICHIMURA MASAYA;MASUI KANJI |
分类号 |
C23C18/44;C23C18/14;(IPC1-7):C23C18/44 |
主分类号 |
C23C18/44 |
代理机构 |
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