发明名称 PHOTODEPOSITION GOLD PLATING METHOD AND GOLD PLATING FORMATION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a photodeposition gold plating method which can be easily practiced without limitation on the conductivity of a substrate or can simply perform the formation of a gold plating locally or entirely on the surface of the substrate. SOLUTION: The photodeposition gold plating method comprises setting a substrate 2 to be plated in an aqueous solution containing metal ions and a reducing agent and irradiating the substrate 2 with light in the ultraviolet region from a light source 6 to form a gold plating on the surface of the substrate 2 by a photodeposition reaction. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005060828(A) 申请公布日期 2005.03.10
申请号 JP20040210430 申请日期 2004.07.16
申请人 ICHIMURA MASAYA;MASUI KANJI;TOKAI RIKA CO LTD 发明人 ICHIMURA MASAYA;MASUI KANJI
分类号 C23C18/44;C23C18/14;(IPC1-7):C23C18/44 主分类号 C23C18/44
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