EXPOSURE METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

An exposure method and apparatus for efficiently controlling the non rotationally symmetrical component of the image-forming characteristic when the distribution of the amount of exposure light passing through a mask and at least a part of the optical members of the projection optical system is in a non rotational symmetry. A reticle (11) is illuminated with an exposure light (IL) from an illuminating optical system, and the pattern of the reticle (11) is projected onto a wafer (18) through a projection optical system (14). When the reticle (11) is illuminated with the exposure light (IL) by dipole illumination in the X-direction, the region defined by rotating the region illuminated with the exposure light (IL) through about 90° with respect to a lens (32) near the pupil of the projection optical system (14) is partially illuminated with a non-exposure light (LB) from a non-exposure light illuminating mechanism (40). The wavelength band of the non-exposure light (LB) is different from that of the exposure light (IL).