发明名称 POLISHING DEVICE AND POLISHED SURFACE OBSERVING METHOD USING IT
摘要 PROBLEM TO BE SOLVED: To provide a polishing device and a polished surface observing method using this where observation working efficiency does not so decrease even when repeating of polishing and observation of the polished member is diligently performed, the focal distance of a microscope may be constant, and the space is not taken. SOLUTION: The polishing device 1A is constituted by arranging the microscope 23 facing a moving back position of the polishing surface Ws of a polishing member W in a hollow rotary shaft 4A of the polishing member W and connecting a monitor 24 to the microscope 23. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005059139(A) 申请公布日期 2005.03.10
申请号 JP20030291852 申请日期 2003.08.11
申请人 SONY CORP 发明人 YADA KAORI
分类号 B24B7/20;(IPC1-7):B24B7/20 主分类号 B24B7/20
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