发明名称 COPPER-NICKEL-SILICON TWO PHASE QUENCH SUBSTRATE
摘要 A copper- nickel-silicon quench substrate rapidly solidifies molten alloy into microcrystalline or amorphous strip. The substrate is composed of a thermally conducting alloy. It has a two-phase microstructure with copper rich regions surrounded by a discontinuous network of nickel silicide pass. The microstructure is substantially homogenous. Casting of strip is accomplished with minimal surface degradation as a function of casting time. The quantity of material cast during each run is improved without the toxicity encountered with copper-beryllium substrates.
申请公布号 WO2005021812(A2) 申请公布日期 2005.03.10
申请号 WO2004US26381 申请日期 2004.08.13
申请人 METGLAS, INC.;MYOJIN, SHINYA;BYE, RICHARD, L.;DECRISTOFARO, NICHOLAS, J.;MILLURE, DAVID, W.;SCHUSTER, GARY, B., A. 发明人 MYOJIN, SHINYA;BYE, RICHARD, L.;DECRISTOFARO, NICHOLAS, J.;MILLURE, DAVID, W.;SCHUSTER, GARY, B., A.
分类号 B21J1/04;B21J5/00;B22D11/06;B22D21/00;C22C;C22C9/06;C22F1/00;C22F1/08 主分类号 B21J1/04
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