| 摘要 |
PROBLEM TO BE SOLVED: To provide an atomizing apparatus achieving a low grain size ratio, a low gas-liquid mass ratio and the control of an atomization taper angle and satisfying the demand for further fine atomization of metal powder granules after atomizing. SOLUTION: This atomizing apparatus is constituted as a sealed system, and has a central main channel 2 provided on its top face for introducing a liquid metal to the apparatus and gas branch channels 3 on left and right sides of the apparatus for introducing a gas. A separator 5 is disposed below the outlet port of the central main channel in a mixing chamber of the gas branch channel 3. A nozzle structure 4 is installed on a face of the apparatus opposite to the central main channel. The nozzle structure, the separator and the central main channel are aligned on the same central axis. The metal granule is atomized into a grain having a grain size of not larger than 10μm to meet the demand of a wafer packaging business and a nano-technology business in the present-day high technology industries. COPYRIGHT: (C)2005,JPO&NCIPI
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