发明名称 VACUUM TREATMENT APPARATUS AND VAPOR DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To solve such a problem that an undesirable influence by organic matter is not taken into consideration, which is generated due to a member itself constituting a vacuum treatment apparatus to be used for manufacturing an organic EL element, or the like. SOLUTION: Each of the members of the vacuum treatment apparatus is subjected to such a treatment that the emission of the organic matter component is decreased while finding that the element is contaminated with the organic matter component emitted from each of the members such as a crucible and a gasket constituting the vacuum treatment apparatus. For example, the crucible is formed from a material having low catalytic activity to a material to be deposited by evaporation. The gasket is subjected to such a treatment that the elution of the organic matter is decreased or formed from a material containing little organic matter. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005058978(A) 申请公布日期 2005.03.10
申请号 JP20030296439 申请日期 2003.08.20
申请人 OMI TADAHIRO 发明人 OMI TADAHIRO;SHIRAI YASUYUKI;MORIMOTO AKITA
分类号 H05B33/10;B01J3/00;B01J3/02;C23C14/24;C23C14/56;H01L51/50;(IPC1-7):B01J3/00;H05B33/14 主分类号 H05B33/10
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