POSITIVE TONE LITHOGRAPHY IN CARBON DIOXIDE SOLVENTS
摘要
A method for carrying out positive tone lithography with a carbon dioxide solvent system is carried out by (a) providing a substrate having a polymer resist layer formed thereon; (b) exposing at least one portion of the polymer resist layer to radiant energy to form at least one light field region in the polymer resist layer; and then (c) contacting the polymer resist layer to a carbon dioxide solvent system, the solvent system preferably comprising a polar group, under conditions in which the at least one light field region is preferentially removed.
申请公布号
WO2004046826(A3)
申请公布日期
2005.03.10
申请号
WO2003US36670
申请日期
2003.11.12
申请人
MICELL TECHNOLOGIES, INC.;MCCLAIN, JAMES, B.;DEYOUNG, JAMES, P.