发明名称 METHOD FOR POSTBAKING LITHOGRAPHIC PRINTING PLATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for making a lithographic printing plate including a postbaking step which is carried out within a dwell-time of less than 1 minute and which results in improvement in chemical resistance of a coating against a printing liquid and press chemicals. <P>SOLUTION: The method includes steps of: (i) preparing a lithographic printing plate precursor comprising a photosensitive coating on a substrate having a hydrophilic surface; (ii) image-wise exposing the photosensitive coating; (iii) developing the exposed coating to form an image on the substrate, and optionally gumming the plate; and (iv) baking the image on the plate. The baking step is carried out within a dwell-time of less than 1 minute, and the chemical resistance of the coating against a printing liquid and press chemicals is improved. The baking step is preferably carried out by exposing the printing plate to an IR ray source, preferably in a dynamic configuration. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005062870(A) 申请公布日期 2005.03.10
申请号 JP20040232444 申请日期 2004.08.09
申请人 AGFA GEVAERT NV 发明人 VERSCHUEREN ERIC;VAN DAMME MARC
分类号 G03F7/004;B41C1/10;B41N1/14;B41N3/00;G03F7/00;G03F7/20;G03F7/40 主分类号 G03F7/004
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