发明名称 ALKALI-SOLUBLE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIN LAYER
摘要 <P>PROBLEM TO BE SOLVED: To provide a new alkali-soluble photosensitive resin composition having easy workability, high performance and high reliability. <P>SOLUTION: The alkali-soluble photosensitive resin composition contains (A) an alkali-soluble resin having a carboxyl equivalent of &le;400 g/mol, which is a resin obtained by reacting a compound having a benzocyclobutene structure and a carboxyl group in one molecule with a compound having two or more benzocyclobutene structures in one molecule by heating at 100-200&deg;C, (B) a compound having an epoxy group, (C) 0.01-10 pts. wt. of a basic substance based on 100 pts. wt. of the alkali-soluble resin, and (D) a photosensitive material having a 1,2-benzoquinonediazido structure or a 1,2-naphthoquinonediazido structure. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005062293(A) 申请公布日期 2005.03.10
申请号 JP20030289656 申请日期 2003.08.08
申请人 SUMITOMO BAKELITE CO LTD 发明人 TAKEUCHI ETSU;MAKABE HIROAKI
分类号 G03F7/033;G03F7/004;G03F7/40;H01L21/027 主分类号 G03F7/033
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