发明名称 |
Barrier layers for microelectromechanical systems |
摘要 |
A method for processing microelectromechanical devices is disclosed herein. The method prevents the diffusion and interaction between sacrificial layers and structure layers of the microelectromechanical devices by providing selected barrier layers between consecutive sacrificial and structure layers.
|
申请公布号 |
US2005054135(A1) |
申请公布日期 |
2005.03.10 |
申请号 |
US20040969380 |
申请日期 |
2004.10.19 |
申请人 |
PATEL SATYADEV;DOAN JONATHAN;HUIBERS ANDREW |
发明人 |
PATEL SATYADEV;DOAN JONATHAN;HUIBERS ANDREW |
分类号 |
B81B7/00;B81C;B81C1/00;H01L21/00;H01L21/76;(IPC1-7):H01L21/00 |
主分类号 |
B81B7/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|