| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of aligning with high accuracy and a small variance of errors. SOLUTION: A platen 3 is moved for aligning and the positions of a substrate mark 10 and a mask mark 20 are identified to detect the errorΔD between the marks. Whether theΔD is less than a tolerance D1 or not is decided by a deciding device 7, and ifΔD<D1, a decision device 8 decides to proceed exposure. IfΔD>D1, aligning and deciding are repeated for specified times. If the error remains asΔD>D1 even after repeating the procedure for the specified times, whetherΔD is less than D2 or not is decided. IfΔD<D2, to proceed exposure is decided. IfΔD>D2, the substrate W is ejected out of the system. COPYRIGHT: (C)2005,JPO&NCIPI
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