发明名称 |
LIFT HOOP OF ASHING CHAMBER IN SEMICONDUCTOR ETCHING APPARATUS TO ALIGN TITLED WAFER |
摘要 |
PURPOSE: A lift hoop of an ashing chamber in a semiconductor etching apparatus is provided to align titled wafers using an inclined portion of a lift hoop. CONSTITUTION: A lift hoop of an ashing chamber includes an inclined portion and a flat portion. Three wafer supporting portions(500) are linked by a ring-shaped body from the outer side. The outer side of the inclined portion(502) is higher than the inner side thereof. A wafer is placed at the flat portion(504) formed in the inner(lower) side of the inclined portion. A wafer is supported by three wafer supporting portions.
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申请公布号 |
KR20050023534(A) |
申请公布日期 |
2005.03.10 |
申请号 |
KR20030059830 |
申请日期 |
2003.08.28 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YI, JUNG HUI |
分类号 |
H01L21/3065;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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