exhaust system of equipment for semiconductor device fabrication and method there of,申请号KR20020076150-传众专利搜索

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发明名称	exhaust system of equipment for semiconductor device fabrication and method there of
摘要
申请公布号	KR100475746(B1)	申请公布日期	2005.03.10
申请号	KR20020076150	申请日期	2002.12.03
申请人		发明人
分类号	H01L21/02;(IPC1-7):H01L21/02	主分类号	H01L21/02
代理机构		代理人
主权项
地址

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