发明名称 Ga-DOPED CRYSTAL SILICON,ITS MANUFACTURING METHOD AND Ga-DOPED CRYSTAL SILICON MANUFACTURING APPARATUS THEREFOR, AS WELL AS SOLAR BATTERY USING Ga-DOPED CRYSTAL SILICON SUBSTRATE AND ITS MANUFACTURE METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for suppressing the scattering(nonuniforming) of the resistivity of a Ga-doped polycrystal Si manufactured by the cast method, and to provide a technical method for enhancing the manufacturing yield of a polycrystal silicon solar battery. <P>SOLUTION: The method for manufacturing the Ga-doped crystal silicon comprises a melting step of mixing a raw material silicon with a gallium dopant and heating the resultant mixture to a predetermined temperature to melt the same and a crystal growing step of cooling the melted raw material silicon and growing the crystal silicon. The method is further characterized by adding a new raw material silicon to the melted raw material silicon in the crystal growing step. The Ga-doped crystal silicon manufacturing apparatus used for the manufacturing method is provided. The solar battery using the Ga-doped crystal silicon is also provided. The method for manufacturing the solar battery comprises a substrate manufacturing step of manufacturing the substrate from the Ga-doped crystal silicon, a p-n junction forming step of forming a p-n junction to the manufactured substrate and an electrode forming step of forming an electrode on the substrate in which the p-n junction is formed. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005060176(A) 申请公布日期 2005.03.10
申请号 JP20030293389 申请日期 2003.08.14
申请人 NOKODAI TLO KK 发明人 SAITO TADASHI;HASHIGAMI HIROSHI;YAMAGA NORIO;HIRASAWA TERUHIKO
分类号 C01B33/02;C30B11/00;C30B29/06;H01L31/04;(IPC1-7):C01B33/02 主分类号 C01B33/02
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