发明名称 |
Ga-DOPED CRYSTAL SILICON,ITS MANUFACTURING METHOD AND Ga-DOPED CRYSTAL SILICON MANUFACTURING APPARATUS THEREFOR, AS WELL AS SOLAR BATTERY USING Ga-DOPED CRYSTAL SILICON SUBSTRATE AND ITS MANUFACTURE METHOD |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for suppressing the scattering(nonuniforming) of the resistivity of a Ga-doped polycrystal Si manufactured by the cast method, and to provide a technical method for enhancing the manufacturing yield of a polycrystal silicon solar battery. <P>SOLUTION: The method for manufacturing the Ga-doped crystal silicon comprises a melting step of mixing a raw material silicon with a gallium dopant and heating the resultant mixture to a predetermined temperature to melt the same and a crystal growing step of cooling the melted raw material silicon and growing the crystal silicon. The method is further characterized by adding a new raw material silicon to the melted raw material silicon in the crystal growing step. The Ga-doped crystal silicon manufacturing apparatus used for the manufacturing method is provided. The solar battery using the Ga-doped crystal silicon is also provided. The method for manufacturing the solar battery comprises a substrate manufacturing step of manufacturing the substrate from the Ga-doped crystal silicon, a p-n junction forming step of forming a p-n junction to the manufactured substrate and an electrode forming step of forming an electrode on the substrate in which the p-n junction is formed. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
申请公布号 |
JP2005060176(A) |
申请公布日期 |
2005.03.10 |
申请号 |
JP20030293389 |
申请日期 |
2003.08.14 |
申请人 |
NOKODAI TLO KK |
发明人 |
SAITO TADASHI;HASHIGAMI HIROSHI;YAMAGA NORIO;HIRASAWA TERUHIKO |
分类号 |
C01B33/02;C30B11/00;C30B29/06;H01L31/04;(IPC1-7):C01B33/02 |
主分类号 |
C01B33/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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