发明名称 |
EXPOSURE APPARATUS AND DEVICE PRODUCING METHOD |
摘要 |
<p>In an exposure apparatus (EX), a liquid (1) is placed between a projection optical system (PL) and a substrate (P), and the apparatus (EX) exposes the substrate (P) by projecting an image of a pattern on the substrate (P) through the optical projection system (PL) and the liquid (1). The apparatus has a liquid removing mechanism (40) provided near an image surface of the projection optical system (PL) and intermittently blowing a gas to a reference member (7) and a moving mirror (55) to which the liquid (1) is adhered, removing the liquid. In projecting a pattern on a substrate through a projection optical system and a liquid and exposing the substrate, the structure above makes it possible that unnecessary liquid is removed and a desired device pattern is formed on the substrate.</p> |
申请公布号 |
WO2005022616(A1) |
申请公布日期 |
2005.03.10 |
申请号 |
WO2004JP12795 |
申请日期 |
2004.08.27 |
申请人 |
NIKON CORPORATION;HARA, HIDEAKI;TAKAIWA, HIROAKI |
发明人 |
HARA, HIDEAKI;TAKAIWA, HIROAKI |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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