| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of cooling an optical component with which an optical component is cooled efficiently and adequately without influence on exposure of external disturbances such as vibrations, deterioration of position stability, degradation of surface geometry, or the like; circuit patterns are precisely exposed and transferred onto a wafer, resulting in reduction of the fraction defective of the wafers; and high-performance wafers are manufactured. SOLUTION: This method of cooling an optical component is a cooling method for cooling a reflecting mirror 3a that is irradiated by an EUV light 2e. When the exposure is not practiced, a heat reservoir 26, which is composed of ethanol 27 filled in a prescribed closed chamber 26a for cooling the reflecting mirror 3a, is cooled, and when the exposure is practiced, the heat reservoir 26 is not cooled. COPYRIGHT: (C)2005,JPO&NCIPI |
