MASK FOR ION MILLING SAMPLE MANUFACTURING APPARATUS AND SAMPLE MANUFACTURING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a mask for an ion milling sample manufacturing apparatus and the sample manufacturing apparatus which manufacture a sample having a desired cross section. SOLUTION: A figure indicates the course for etching a processed part b of the sample 6. An edge 8b of the mask 8 is etched as an original shape indicated by a dashed line before irradiation of an ion beam is approximately maintained. Although a thickness h2of a side face 8c of the mask is gradually reduced by ion etching, the side face 8c of the mask is continuously located on a central axis of an ion beam IB. The sample 6 is etched so as to obtain the desired cross section S. COPYRIGHT: (C)2005,JPO&NCIPI