发明名称 PHOTOMETRIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To make the intensity-of-light distribution on a photometric surface constant even in an irradiation optical system for performing the irradiation of an irradiation beam from an oblique direction and to suppress fluctuations in the detection quantity of light with respect to fluctuations in the position of the photometric surface to ensure photometric precision. SOLUTION: This oblique irradiation photometric apparatus is equipped with the irradiation optical system 2 for irradiating the photometric surface 5 with the irradiation beam and a light detecting optical system 3 for measuring the reflected light from the photometric surface 5. The intensity-of-light distribution of the irradiation beam due to the irradiation optical system 2 has distribution characteristics wherein the intensity of light decreases or increases gradually as separating from an optical axis. When the photometric surface 5 is irradiated with the irradiation beam, a region wherein the intensity-of-light distribution on the photometric surface 5 becomes constant is provided and the photometric region (b) of the light detecting optical system 3 is set to the inside of this region. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005062085(A) 申请公布日期 2005.03.10
申请号 JP20030295095 申请日期 2003.08.19
申请人 FUJI KIKI KOGYO KK 发明人 KIMURA MUNEYASU
分类号 G01N21/01;G01N21/47;(IPC1-7):G01N21/01 主分类号 G01N21/01
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