发明名称 A METHOD FOR PATTERN METALIZATION OF SUBSTRATES
摘要 The present invention provides a method for forming an adhesion layer in contact with a first surface of a substrate and a surface of a layer having electrically conductive properties using electrophotographic imaging compound as a mask. The adhesion layer improves the lamination properties of the electrically conductive layer to the substrate. The improved lamination properties to facilitate and increase the reliability and quality of a resulting product having an electronic circuit formed in accordance with the present invention. The method disclosed herein is well suited for use with rigid polymeric substrates and flexible polymeric substrates.
申请公布号 WO2005022966(A2) 申请公布日期 2005.03.10
申请号 WO2004US28247 申请日期 2004.08.30
申请人 VISIBLE TECH-KNOWLEDGY, INC.;FORBES, CHARLES;GELBMAN, ALEXANDER;TURNER, CHRISTOPHER;GLESKOVA, HELENA;WAGNER, SIGURD, RICHARD 发明人 FORBES, CHARLES;GELBMAN, ALEXANDER;TURNER, CHRISTOPHER;GLESKOVA, HELENA;WAGNER, SIGURD, RICHARD
分类号 B32B3/00;B32B7/00;B32B15/00;G02F1/1333;G02F1/1362;G02F1/167;H01L21/00;H01L21/4763;H01L21/48;H01L21/768;H01L21/77;H01L21/84;H01L23/48;H01L23/52;H01L29/40;H01L29/786;H05K;H05K3/04;H05K3/18;H05K3/38 主分类号 B32B3/00
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