发明名称 METHOD FOR MANUFACTURING SUBSTRATE DEVICE AND SUBSTRATE DEVICE, AND ELECTROOPTICAL DEVICE EQUIPPED WITH THE SAME, AND ELECTRONIC EQUIPMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for easily manufacturing a highly reliable storage capacitor on a substrate used for a liquid crystal device etc. <P>SOLUTION: The method for manufacturing the substrate device equipped with the storage capacitor on the substrate of the liquid crystal device etc., includes a filming process of laminating a lower conductive layer as a lower capacity electrode of the storage capacitor, an intermediate layer which becomes a dielectric film of the storage capacitor, and an upper conductive layer as an upper capacity electrode of the storage capacitor on the substrate in this order, a mask forming process of forming a mask having a specified plane pattern on the upper conductive layer, a 1st patterning process of patterning the upper conductive layer into a specified plane pattern by etching through the mask, a 2nd patterning process of patterning an intermediate layer into a specified plane pattern by etching through the mask, a mask moving-back process of moving the mask back, a 3rd patterning process of patterning the upper conductive layer into a plane shape corresponding to the moved-back mask by etching the upper conductive layer through the moved-back mask, and a peeling process of peeling the mask. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005062418(A) 申请公布日期 2005.03.10
申请号 JP20030291638 申请日期 2003.08.11
申请人 SEIKO EPSON CORP 发明人 KAWADA HIDENORI
分类号 G02F1/1368;G09F9/30;(IPC1-7):G09F9/30;G02F1/136 主分类号 G02F1/1368
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