发明名称 RESIN VAPOR DEPOSITION UNIT
摘要 PROBLEM TO BE SOLVED: To provide a resin vapor deposition unit with which the resin distribution uniformity is improved in a relatively simple manner, and the distribution is ensured for a long period of time. SOLUTION: The resin vapor deposition unit to perform film deposition on a cylindrical surface of a rotating drum-shaped can roll has structure in which resin vapor guided by the inner wall of the unit is exhausted into other units in the circumferential direction or exhausted into a main exhaust system. With the structure, the resin vapor has an effective exhaust flow rate higher than an excessive resin vapor amount which does not contribute to film deposition. Thus, the resin vapor flow rate is increased and maintained, and dispersion in the film deposition rate can be reduced. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005060793(A) 申请公布日期 2005.03.10
申请号 JP20030294329 申请日期 2003.08.18
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TAKIZAWA TAKAHIRO;NAGANUMA SOICHI;ARAI YASUSHI;MIYAZAWA KAZUTOSHI
分类号 C23C14/24;C23C14/12;(IPC1-7):C23C14/24 主分类号 C23C14/24
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