发明名称 |
PSM alignment method and device |
摘要 |
The present invention relates to alignment of a writing system and a workpiece. In particular, it relates to alignment to write a second layer pattern on a workpiece that has a first layer pattern, using an SLM. It extends to producing a mask or reticle, and to producing a layer of a device using the mask or reticle. Particular aspects of the present invention are described in the claims, specification and drawings.
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申请公布号 |
US2005053273(A1) |
申请公布日期 |
2005.03.10 |
申请号 |
US20040911218 |
申请日期 |
2004.08.04 |
申请人 |
MICRONIC LASER SYSTEMS AB |
发明人 |
OSTROM THOMAS;ZERNE RAOUL |
分类号 |
G02B26/08;G03C5/00;G03F7/20;G03F9/00;G06K9/00;(IPC1-7):G06K9/00 |
主分类号 |
G02B26/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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