Method of manufacturing a semiconductor device,申请号KR20020062420-传众专利搜索

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发明名称	Method of manufacturing a semiconductor device
摘要
申请公布号	KR100473735(B1)	申请公布日期	2005.03.10
申请号	KR20020062420	申请日期	2002.10.14
申请人		发明人
分类号	H01L21/28;H01L21/31;H01L21/265;H01L21/283;H01L21/318;H01L21/8234;H01L27/088;(IPC1-7):H01L21/31	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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