RETICLE FOR MANUFACTURING SEMICONDUCTOR WITH PRE-ALIGNMENT MARKS TO IMPROVE EXACTNESS AND REPRODUCTIVITY OF PRE-ALIGNMENT AND RETICLE PRE-ALIGNING METHOD USING THE SAME

摘要

PURPOSE: A reticle for manufacturing a semiconductor and a reticle pre-aligning method using the same are provided to improve exactness and reproductivity of pre-alignment of the reticle by using a plurality of pre-alignment marks formed on a third surface of the reticle itself. CONSTITUTION: A reticle(10') includes a quartz plate, a chrome pattern, a plurality of alignment marks and a plurality of pre-alignment marks. The quartz plate(14) includes a first surface(11), a second surface(12) opposite to the first surface and a plurality of third surfaces(13) between the first and second surfaces. The chrome pattern(15) is formed on the first surface of the quartz plate. The plurality of alignment marks(16) are formed on a periphery of the quartz plate. The plurality of pre-alignment marks(17) are formed at least two third surfaces opposite to each other.