| 摘要 |
<p>A lithographic apparatus comprising a projection system PL for projecting a patterned beam onto a target portion of a substrate, the projection system comprising a support frame 4 for supporting a plurality of optical elements including at least one moveable optical element M1-M4, M6, the plurality of optical elements being disposed in the frame in a spaced relationship; and wherein the apparatus further comprises a thermal deformation compensation unit 10, 12, 14, 15, 16, 18 comprising at least one sensor 10 for sensing the temperature at a location on said support frame 4 and an adjustment unit 15 arranged to adjust the position of said at least one moveable mirror M1-M4, M6 so as to compensate for a deformation of the frame 4, in response to the at least one temperature sensed by the at least one sensor 10. <IMAGE></p> |
