| 发明名称 |
COMPOSITION FOR REMOVING SIDEWALL RESIDUES |
| 摘要 |
<p>The invention relates to a composition for removing sidewall residues from metal surfaces, particularly aluminum or aluminum-containing surfaces, especially aluminum or aluminum-containing surfaces during the production of semiconductor elements.</p> |
| 申请公布号 |
KR20050023324(A) |
申请公布日期 |
2005.03.09 |
| 申请号 |
KR20047020845 |
申请日期 |
2003.05.27 |
| 申请人 |
MERCK PATENT GMBH |
发明人 |
RAIMUND MELLIES;MARC BORNER;LUCIA ARNOLD;ANDREA BARKO;RUDOLF RHEIN |
| 分类号 |
H01L21/3065;C11D3/39;C11D7/08;C11D11/00;G03F7/42;H01L21/02;H01L21/304;H01L21/3213;H01L21/768;H01L25/00 |
主分类号 |
H01L21/3065 |
| 代理机构 |
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代理人 |
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