发明名称 EXPOSURE APPARATUS WITH FIRST AND SECOND CONTROL LENSES AND METHOD OF CONTROLLING LIGHT INTENSITY AND LIGHT DISTRIBUTION USING THE SAME
摘要 PURPOSE: An exposure apparatus and method of controlling light intensity and distribution using the same are provided to realize optimally the light intensity and distribution without the replacement of a lens by rotating a first and second control lens. CONSTITUTION: An exposure apparatus includes a light source, a plurality of mirrors, a plurality of lenses, and a light intensity and distribution controlling. The controlling lens(400) includes a disc type of first and second control lens. The first control lens(410) includes a first pivot(411), a plurality of first openings(413) along the periphery, and a first fly lens(414) within each first opening. The second control lens(420) includes a second pivot(421), a plurality of second openings(423) along the periphery, and a second fly lens(424) within each second opening.
申请公布号 KR20050022615(A) 申请公布日期 2005.03.08
申请号 KR20030060195 申请日期 2003.08.29
申请人 DONGBUANAM SEMICONDUCTOR INC. 发明人 KANG, KYUNG HO
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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