发明名称 POWER SOURCE DEVICE FOR SUPPLYING PLATING CURRENT
摘要 An electroplating current supply system includes a power supply unit for supplying an object to be plated (4) with an electroplating current whose polarity is inverted at predetermined intervals. The power supply unit includes a first DC power supply (3A) supplying a positive current and a second power supply (3B) supplying a negative current. The system includes further a processing unit (58) for controlling the ratio in magnitude and duration of the positive current (I2) to the negative current (I1) supplied to the object so as to plate the object with a uniform coating.
申请公布号 KR100471944(B1) 申请公布日期 2005.03.08
申请号 KR20020004347 申请日期 2002.01.25
申请人 发明人
分类号 C25D7/00;C25D17/00;C25D5/18;C25D21/12;G05F1/00;H02J1/10;H02M7/00;H02M7/12;H05K3/18;H05K3/24;(IPC1-7):C25D17/00 主分类号 C25D7/00
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