APPARATUS FOR INSPECTING WAFER TO PRECISELY DETECT ALL DEFECTS ON PHOTORESIST LAYER EVEN WHEN PHOTORESIST LAYER OF VARIOUS COLORS IS FORMED ON WAFER

摘要

PURPOSE: An apparatus for inspecting a wafer is provided to precisely detect all defects on a photoresist layer even when a photoresist layer of various colors is formed on a wafer by changing a light source to a laser source having a wavelength of a different size according to the color of a layer formed on the wafer. CONSTITUTION: A wafer on which a photoresist layer of a predetermined color is formed is placed on a wafer stage. At least one detector is installed in the periphery of the wafer to detect a defect more than a predetermined size generated on the photoresist layer. A laser light source part(110) irradiates a laser beam to the photoresist layer, including a plurality of light sources so that a laser beam of different wavelengths is irradiated according to the color of the photoresist layer. A reflection part(140) reflects the laser beam to a predetermined angle so that the laser beam oscillated from the laser light source part is irradiated to the photoresist layer. A projection optical part(150) magnifies and reduces the laser beam oscillated from the laser light source part by a predetermined magnification. A shutter(120) selectively blocks the laser beam oscillated from the laser light source part.