| 摘要 |
PURPOSE: An ion beam irradiation apparatus is provided to obtain an alignment layer having a desired alignment direction and a desired pretilt angle, by setting proper process conditions considering the size of an ion gun, the sizes of the substrates and the irradiation time of the ion beam. CONSTITUTION: An ion beam irradiation apparatus comprises a vacuum chamber(340), a substrate(320) moving in one direction, and an ion gun(302) irradiating the substrate with an ion beam in the vacuum chamber. The ion gun is capable of having a bar-type. Herein, the apparatus satisfies the relation formula, 1.6x10¬-4<=(LgxIxT)/Ls<=1.6x 10¬-2, where I is a current intensity of the ion beam, T is an irradiation time on the substrate, Lg is a length of a short side of an outlet of the ion gun, and Ls is a length of moving direction of the substrate.
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