SPUTTERING EQUIPMENT WITH ARGON-IMPLANTED DUAL BELLOWS TO RAPIDLY CHECK DAMAGE OF BELLOWS AND AVOID INFLUENCE UPON PROCESS EVEN WHEN BELLOWS IS DAMAGED

摘要

PURPOSE: Sputtering equipment with an argon-implanted dual bellows is provided to rapidly check the damage of a bellows and avoid an influence upon a process even when the bellows is damaged by installing a leak detecting unit between an internal bellows and an external bellows. CONSTITUTION: A sputtering process is performed in a predetermined space of a chamber. A wafer placement part(13) is installed in the bottom of the chamber. One side of an up-down apparatus(15) is inserted into the chamber and the other side of the up-down apparatus is installed in the outside of the chamber so that the wafer placement part moves up/down. An internal bellows(21) avoids vacuum leak in the chamber according to the driving of the up-down apparatus, installed to surround the up-down apparatus. An external bellows(23) is separated from the internal bellows by a predetermined interval, installed to surround the internal bellows. A gas injection hole(25) injects argon gas to a gap between the internal bellows and the external bellows. A leak detecting unit(27) is installed between the internal bellows and the external bellows.