发明名称 |
Pattern recognition method, pattern check method and pattern recognition apparatus as well as pattern check apparatus using the same methods |
摘要 |
With respect to two pattern sets obtained on different conditions, a feature-extraction matrix, which maximizes between-class scatter and minimizes within-class scatter, is found respectively. A first feature amount is calculated using one of the feature-extraction matrices. The first feature amount and the two matrices are retained in a referential database. A pattern is determined to a second feature amount-extracted by applying another feature-extraction matrix to a pattern input-by extracting a most similar element out of the first feature amount retained in the referential database.
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申请公布号 |
US6865296(B2) |
申请公布日期 |
2005.03.08 |
申请号 |
US20010874199 |
申请日期 |
2001.06.05 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
NAGAO KENJI |
分类号 |
G10L15/10;G06K9/62;G06T7/00;(IPC1-7):G06K9/62 |
主分类号 |
G10L15/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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