发明名称 Germanium field effect transistor and method of fabricating the same
摘要 A method (and structure) for an electronic chip having at least one layer of material for which a carrier mobility of a first carrier type is higher in a first crystal surface than in a second crystal surface and for which a carrier mobility of a second carrier type is higher in the second crystal surface than the first crystal surface includes a first device having at least one component fabricated on the first crystal surface of the material, wherein an activity of the component of the first device involves primarily the first carrier type, and a second device having at least one component fabricated on the second crystal surface of the material, wherein an activity of the component of the second device involves primarily the second carrier type.
申请公布号 US6864520(B2) 申请公布日期 2005.03.08
申请号 US20020116568 申请日期 2002.04.04
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 FISCHETTI MASSIMO V.;LAUX STEVEN E.;SOLOMON PAUL M.;WONG HON-SUM PHILIP
分类号 H01L27/08;H01L21/8238;H01L21/84;H01L27/092;H01L27/12;H01L29/10;H01L29/423;H01L29/786;(IPC1-7):H01L27/148 主分类号 H01L27/08
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