Fabricating method for semiconductor device,申请号KR19990061849-传众专利搜索

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发明名称	Fabricating method for semiconductor device
摘要
申请公布号	KR100474546(B1)	申请公布日期	2005.03.08
申请号	KR19990061849	申请日期	1999.12.24
申请人		发明人
分类号	H01L21/28;H01L27/085;H01L21/311;H01L21/314;H01L21/316;H01L21/60;H01L21/768;H01L21/8242;H01L27/108;(IPC1-7):H01L27/085	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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