| 摘要 |
A reflectometer device for determining the quality characteristics of an electronic chip mask blank utilizing a source of electromagnetic radiation in the extreme ultraviolet region. The source is passed to a monochrometer which includes a mirror, a rotatable grating, and an exit slit. The radiation travels to the mirror and is reflected to the grating which, in turn, provides a source of electromagnetic radiation which is essentially continuous and of a particular bandwidth. The grating is rotated to tune such source of electromagnetic radiation which is passed to the subject blank mask. Upon reflection from the mask, a detector determines the intensity of the reflected beam from the mask and translates such measurement into a determination of reflectivity.
|
