LITHOGRAPHY PROJECTION APPARATUS EMPLOYING LIQUID SUPPLY SYSTEM CONTAINING LIQUID PURIFICATION DEVICE, AND IMMERSION SOLUTION USED IN SPACE BETWEEN FINAL DEVICE OF PROJECTION SYSTEM AND SUBSTRATE TO BE IMAGED

摘要

PURPOSE: Provided are a lithography projection apparatus to prevent the pollution of devices of projection system by deposit, and an immersion solution used in the space between the final device of a projection system of the apparatus and a substrate to be imaged. CONSTITUTION: The lithography projection apparatus comprises a radiation system which provides a radiation projection beam; a support structure which supports a patterning means patterning the projection beam according to a desired pattern; a substrate table which holds a substrate; a projection system which projects the patterned beam on the target part of the substrate; and a liquid supply system which charges an immersion solution partially and totally into the space between the final device of a radiation system of the apparatus and the substrate, wherein the liquid supply system contains a liquid purification device for purifying the immersion solution. Preferably the liquid purification device comprises a distillation unit; a desalting device; and/or a filter.