发明名称 |
METHOD FOR FABRICATING ELECTRONIC DEVICE TO FORM ORGANIC THIN FILM OF LOW DIELECTRIC CONSTANT |
摘要 |
PURPOSE: A method for fabricating an electronic device is provided to form an organic thin film of a low dielectric constant by improving cohesion between an inorganic thin film and an organic thin film and by avoiding delamination or a crack during a process for forming a multilayered interconnection. CONSTITUTION: Organic radicals are introduced to the surface of an inorganic layer to vary the surface characteristic of the inorganic layer having a contact angle of 50 degrees with water. A fluorinated aromatic hydrocarbon polymer material is analyzed to form a precursor. The precursor is deposited on the inorganic layer to form a fluorinated aromatic hydrocarbon polymer layer on the inorganic layer.
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申请公布号 |
KR20050021895(A) |
申请公布日期 |
2005.03.07 |
申请号 |
KR20040067856 |
申请日期 |
2004.08.27 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
KAJI NARUHIKO;YONEDA KATSUMI |
分类号 |
C23C16/30;C23C16/56;H01L21/31;H01L21/312;H01L21/768;H01L23/522;(IPC1-7):H01L21/31 |
主分类号 |
C23C16/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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