CONTACT STRUCTURE FORMED BY PHOTOLITHOGRAPHY PROCESS,申请号KR20000004199-传众专利搜索

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发明名称	CONTACT STRUCTURE FORMED BY PHOTOLITHOGRAPHY PROCESS
摘要
申请公布号	KR100472580(B1)	申请公布日期	2005.03.07
申请号	KR20000004199	申请日期	2000.01.28
申请人		发明人
分类号	H01L21/66;G01R1/067;G01R1/073;G01R3/00;(IPC1-7):H01L21/66	主分类号	H01L21/66
代理机构		代理人
主权项
地址

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