SYSTEM FOR MAKING THIN FILM TO CONTROL GENERATION OF FLAW ON SUBSTRATE AND IMPROVE HEATING EFFICIENCY

摘要

PURPOSE: A system for making a thin film is provided to control generation of a flaw on a substrate and improve heating efficiency by reducing the particles on the right side and the back side of the substrate. CONSTITUTION: A vacuum chamber has a pumping line(13,14). The inside of the vacuum chamber(1) is divided into the first and second regions by a partition(10). An inner opening is formed in the partition and a substrate(9) passes through the inner opening. The inner opening is closed by a partition valve(15). A thin film is deposited on the substrate in the first region of the vacuum chamber by a deposition unit(2). A heater(3) heats the substrate in the second region before the deposition in the first region. The substrate is held by a holder while the heater heats the substrate in the second region. A boosting gas introducing line introduces boosting gas to the second region and increases the pressure in the second region to a viscous flow scope. A carrier carries the heated substrate to a necessary position in the first region through the inner opening. The substrate comes in point-contact with the holder. The pumping line exhausts the first region to be a vacuum pressure all the time and exhausts the boosting gas introduced from the second region when the second region is connected to the first region as a result of opening of the partition valve so that the second region becomes a vacuum pressure.