WAFER TRANSFER SYSTEM OF WET CLEANING EQUIPMENT TO AVOID DAMAGE TO WAFER AND PREVENT EACH CONSTITUTION INCLUDING ROBOT CHUCK OF TRANSFER ROBOT FROM BEING CONTAMINATED AND DAMAGED

摘要

PURPOSE: A wafer transfer system of wet cleaning equipment is provided to avoid damage to a wafer and prevent each constitution including a robot chuck of a transfer robot from being contaminated and damaged by occasionally checking the align state of the wafer when the wafer is held and transferred. CONSTITUTION: Different kinds of chemicals are received in a plurality of chemical baths that are disposed in a line and adjacent to each other such that the chemical baths include a deionized water bath. A transfer robot selectively holds a plurality of wafers to transfer the wafers in the direction that the chemical baths are disposed, and selectively loads/unloads the wafer to/from each chemical bath. A detecting unit detects an alignment state of a flat zone, installed in the disposition direction of the wafers that are taken out from the chemical bath by the transfer robot and are located in an installation position. A controller receives a detection signal of the detecting unit to determine the alignment state of the wafers and controls each constitution including the transfer robot according to a determination of an alignment defect.