METAL ORGANIC CHEMICAL VAPOR DEPOSITION AND ATOMIC LAYER DEPOSITION OF METAL OXYNITRIDE AND METAL SILICON OXYNITRIDE,申请号KR20047013458-传众专利搜索

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发明名称	METAL ORGANIC CHEMICAL VAPOR DEPOSITION AND ATOMIC LAYER DEPOSITION OF METAL OXYNITRIDE AND METAL SILICON OXYNITRIDE
摘要
申请公布号	KR20050020758(A)	申请公布日期	2005.03.04
申请号	KR20047013458	申请日期	2004.08.27
申请人		发明人
分类号	H01L21/44;(IPC1-7):H01L21/44	主分类号	H01L21/44
代理机构		代理人
主权项
地址

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