发明名称 SHOCK-RESISTANCE TESTING METHOD FOR SEMICONDUCTOR WAFER AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a shock resistance testing method for a wafer which can easily detect a semiconductor wafer having higher possibility for damage in a semiconductor device manufacturing process, and also to provide a method of manufacturing a semiconductor device including the testing process by the same testing method. SOLUTION: A semiconductor wafer is placed on a supporting base with the end extruded from the base and a shock is applied to the end of the semiconductor wafer for the predetermined number of times in predetermined shock acceleration from the lower side (for example, 3 to 7 times in the shock acceleration of 1.5 to 70G). In this case, the shock resistance of the semiconductor wafer is evaluated from the condition of the damage of the wafer. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005056990(A) 申请公布日期 2005.03.03
申请号 JP20030285035 申请日期 2003.08.01
申请人 NIKKO MATERIALS CO LTD 发明人 ARAKAWA ATSUTOSHI;HIRANO RYUICHI
分类号 H01L21/66;(IPC1-7):H01L21/66 主分类号 H01L21/66
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