| 摘要 |
PROBLEM TO BE SOLVED: To reduce non-operating time in the maintenance work of a lithography projection equipment, particularly due to purge/gas supply shutdown. SOLUTION: This lithography projection equipment comprises a control unit 38 configured to switch purge/gas supply system between at least two operation modes, while the control unit supplies non-zero purge/gas flow to chambers 36a to d, which are different in accordance with each operation mode, by controlling the purge/gas supply system. COPYRIGHT: (C)2005,JPO&NCIPI
|
