| 发明名称 |
Composition and method for removing copper-compatible resist |
| 摘要 |
A composition for removing a copper-compatible resist includes about 10 to 30% by weight of an amine compound solvent, the amine compound solvent including an alkanol amine, about 10 to 80% by weight of a glycol group solvent, about 9.5 to 80% by weight of a polar solvent, and about 0.5 to 10% by weight of a corrosion inhibitor.
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| 申请公布号 |
US2005048397(A1) |
申请公布日期 |
2005.03.03 |
| 申请号 |
US20040924841 |
申请日期 |
2004.08.25 |
| 申请人 |
LG.PHILIPS LCD CO., LTD.;DONGJIN SEMICHEM CO., LTD. |
发明人 |
JO GYOO-CHUL;CHAE GEO-SUNG;KWON OH-NAM;LEE KYOUNG-MOOK;HWANG YONG-SUP;KIM SEONG-BAE;JANG SUK-CHANG;YOON SUK-IL |
| 分类号 |
G03F7/42;C11D3/00;C11D7/26;C11D7/32;C11D7/34;C11D11/00;G02F1/133;G02F1/136;G03C11/12;H01L21/027;(IPC1-7):G03C11/12 |
主分类号 |
G03F7/42 |
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