| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a stimulus-sensitive composition having high sensitivity and exhibiting good profile, to provide a photosensitive composition having high sensitivity at an exposure wavelength of ≤200 nm, particularly F<SB>2</SB>laser light (157 nm) and exhibiting good profile, and to provide a new compound (A) that generates an acid or a radical by external stimulation in order to provide these compositions. <P>SOLUTION: The stimulus-sensitive composition comprises the compound (A) that generates an acid or a radical by external stimulation and has a specific structure represented by formula (I). The compound (A) has the specific structure. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
