| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing apparatus of a silicon epitaxial wafer capable of suppressing a solid product material or particles of silicon or the like from being attached to the surface of a substrate. SOLUTION: The manufacturing apparatus 1 of the silicon epitaxial wafer comprises an outer tube 2 whose upper end is closed, a silicon carbide made inner tube 3 whose upper end is opened, a boat 4 supporting semiconductor substrates arranged in a plurality of stages, and a heater 9. The outer tube 2 is made of a quartz, and a silicon carbide made cap 8 is provided at an opened upper end of the inner tube 3 to cover the upper end from the upper side. COPYRIGHT: (C)2005,JPO&NCIPI
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